VULCANO2: new modular standard family
VULCANO2 is a gantry stacked-axes architecture based on mechanical bearing coupled to high-end optical encoders. Use of ETEL renowned iron-core motors, along with innovative design principles, allows reaching high dynamics at much improved geometrical and motion performance levels.
With focus on easing semiconductor applications, the platform remains a match to all diverse markets and needs requiring solutions for higher dynamics; in fact even its best in class footprint excels to maximize its overall Cost of Ownership value proposition. Customers, aiming to reach higher throughput, duty cycles or to serve heavier payloads with no loss of repeatability or of accuracy, can confidently adopt a standard VULCANO2 or a derived customized solution.
VULCANO2 represents also a perfect solution to all use cases where dynamics, duty cycles and payloads are not so stringent, though positioning accuracy must be established for very long times: delivering several hours of u-level navigation accuracy is no longer a dream but a solid reality from this new offering from ETEL.
The use of this platform is suitable for, but not limited to:
- Wafer Process Control applications such as Overlay Metrology, Critical Dimension and Thin film Metrology
- Back-end: flip-chip processes made on large panels/substrates
Characteristics
- Compact footprint
- Payload up to 80 kg
- Nanometer level position stability
- High dynamics
- Excellent bidirectional repeatability and position stability
- ISO 2 clean room compatibility
Ask for the corresponding Integration Manual for more information.
Main specifications
| Description | X1-X2 (bottom) | Y (upper) | Theta |
|---|---|---|---|
| Total stroke | 365 mm | 355 mm | Infinite |
| Maximum speed | 1.2 m/s | 1.2 m/s | 32 rad/s |
| Maximum acceleration | 25 m/s2 | 25 m/s2 | 126 rad/s2 |
| Position accuracy | ±1 µm | ±1 µm | ±3 arcsec |
| Position stability | ±2 nm | ±2 nm | ±0.02 arcsec |
| Bidirectional repeatability | ±250 nm | ±250 nm | ±2 arcsec |
VULCANO2 is a gantry stacked-axes architecture based on mechanical bearing coupled to high-end optical encoders. Use of ETEL renowned iron-core motors, along with innovative design principles, allows reaching high dynamics at much improved geometrical and motion performance levels.
With focus on easing semiconductor applications, the platform remains a match to all diverse markets and needs requiring solutions for higher dynamics; in fact even its best in class footprint excels to maximize its overall Cost of Ownership value proposition. Customers, aiming to reach higher throughput, duty cycles or to serve heavier payloads with no loss of repeatability or of accuracy, can confidently adopt a standard VULCANO2 or a derived customized solution.
VULCANO2 represents also a perfect solution to all use cases where dynamics, duty cycles and payloads are not so stringent, though positioning accuracy must be established for very long times: delivering several hours of u-level navigation accuracy is no longer a dream but a solid reality from this new offering from ETEL.
The use of this platform is suitable for, but not limited to:
- Wafer Process Control applications such as Overlay Metrology, Critical Dimension and Thin film Metrology
- Back-end: flip-chip processes made on large panels/substrates
Characteristics
- Compact footprint
- Payload up to 80 kg
- Nanometer level position stability
- High dynamics
- Excellent bidirectional repeatability and position stability
- ISO 2 clean room compatibility
Ask for the corresponding Integration Manual for more information.
Main specifications
| Description | X1-X2 (bottom) | Y (upper) | Theta |
|---|---|---|---|
| Total stroke | 365 mm | 355 mm | Infinite |
| Maximum speed | 1.2 m/s | 1.2 m/s | 32 rad/s |
| Maximum acceleration | 25 m/s2 | 25 m/s2 | 126 rad/s2 |
| Position accuracy | ±1 µm | ±1 µm | ±3 arcsec |
| Position stability | ±2 nm | ±2 nm | ±0.02 arcsec |
| Bidirectional repeatability | ±250 nm | ±250 nm | ±2 arcsec |